What is epitaxy?

Epitaxy Refers to a crystal growth or material deposition technology, which occupies an extremely important position in the microelectronics and optoelectronics manufacturing process, including: Homoepitaxy, heteroepitaxy and intergrain epitaxy, the new crystalline layer formed by epitaxy has one or more clear crystal domain orientation relative to the substrate or seed, that is, each domain of the new crystalline layer must have a clear crystal orientation relative to the substrate crystal structure.

Epitaxial crystal growth technology has three film forming methods (as shown in the figure) : Volmer-Weber (VW), Frank-van der Merwe (FM) and Stranski-Krastanov (SK).

Usually divided into liquid phase epitaxy (LPE) technology and gas phase epitaxy technology, including gas phase epitaxy and metal organic chemical vapor deposition (MOCVD) and molecular beam epitaxy (MBE). The deposited crystalline film is called epitaxial film or epitaxial layer.

There are three main modes of film growth, including:

(a)Volmer-Weber (VW, island growth)

(b) Frank-van der Merwe (FM, layered growth)

(c) Stranski-Krastanov (SK, layered island growth)

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